Location
1-5, Osadano-Cho, Fukuchiyama, Kyoto
Site area
40,353m2
Major facilities
Reaction facilities such as air oxidation, alkylation, nitration, reduction,
esterification, alkoxylation, halogenation.
Ultra-high-purity colloidal silica, finely powdered spherical silica, organosol
manufacturing facilities
Silica-related research facilities
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